Nd:Glass laser-induced damage to thin films, two-photon excited fluorescence and plasma studies

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Nd:Glass laser-induced damage to thin films, two-photon excited fluorescence and plasma studies

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Title: Nd:Glass laser-induced damage to thin films, two-photon excited fluorescence and plasma studies
Author: Radhakrishnan, P; Dr.Sathianandan, K
Abstract: Laser-induced damage is the principal limiting constraint in the design and operation of high-power laser systems used in fusion and other high-energy laser applications. Therefore, an understanding of the mechanisms which cause the radiation damage to the components employed in building a laser and a knowledge of the damage threshold of these materials are of great importance in designing a laser system and to operate it without appreciable degradation in performance. This thesis, even though covers three distinct problems for investigations using a dye Q-switched multimode Nd:glass laser operating at 1062 nm and emitting 25 ns (FWHM) pulses, lays its main thrust on damage threshold studies on thin films. Using the same glass laser two-photon excited fluorescence in rhodamine 6G and generation and characterisation of a carbon plasma have also been carried out. The thesis is presented in seven chapters.
Description: Department of Physics, Cochin university of Science and Technology
URI: http://dyuthi.cusat.ac.in/purl/3316
Date: 1985-04-30


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