Non-Destructive Evaluation of Ion-Implanted Semiconductor Thin Films Using Photothermal Deflections Spectroscopy

Dyuthi/Manakin Repository

Non-Destructive Evaluation of Ion-Implanted Semiconductor Thin Films Using Photothermal Deflections Spectroscopy

Show full item record

Title: Non-Destructive Evaluation of Ion-Implanted Semiconductor Thin Films Using Photothermal Deflections Spectroscopy
Author: Paulraj,M; Dr.Vijayakumar, K P
Abstract: Materials and equipment which fail to achieve the design requirements or projected life due to undetected defects may require expensive repair or early replacement. Such defects may also be the cause of unsafe conditions or catastrophic unexpected failure, and will lead to loss of revenue due to plant shutdown. Non-Destructive Evaluation (NDE) / Non Destructive Testing (NDT) is used for the examination of materials and components without changing or destroying their usefulness. NDT can be applied to each stage of a system’s construction, to monitor the integrity of the system or structure throughout its life.
URI: http://dyuthi.cusat.ac.in/purl/13
Date: 2004-12


Files in this item

Files Size Format View Description
Dyuthi-T0349.pdf 9.162Mb PDF View/Open PDF

This item appears in the following Collection(s)

Show full item record

Search Dyuthi


Advanced Search

Browse

My Account