On the Growth Mechanism of Nickel and Cobalt Nanowires and Comparison of Their Magnetic Properties

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On the Growth Mechanism of Nickel and Cobalt Nanowires and Comparison of Their Magnetic Properties

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dc.contributor.author Anantharaman, M R
dc.contributor.author Shaijumon, M M
dc.contributor.author Narayanan, T N
dc.contributor.author Ajayan, P M
dc.date.accessioned 2014-07-31T10:09:02Z
dc.date.available 2014-07-31T10:09:02Z
dc.date.issued 2008-10-28
dc.identifier.uri http://dyuthi.cusat.ac.in/purl/4372
dc.description Nano Res (2008) 1: 465 473 en_US
dc.description.abstract Magnetic nanowires (NWs) are ideal materials for the fabrication of various multifunctional nanostructures which can be manipulated by an external magnetic fi eld. Highly crystalline and textured nanowires of nickel (Ni NWs) and cobalt (Co NWs) with high aspect ratio (~330) and high coercivity have been synthesized by electrodeposition using nickel sulphate hexahydrate (NiSO4·6H2O) and cobalt sulphate heptahydrate (CoSO4·7H2O) respectively on nanoporous alumina membranes. They exhibit a preferential growth along〈110〉. A general mobility assisted growth mechanism for the formation of Ni and Co NWs is proposed. The role of the hydration layer on the resulting one-dimensional geometry in the case of potentiostatic electrodeposition is verified. A very high interwire interaction resulting from magnetostatic dipolar interactions between the nanowires is observed. An unusual low-temperature magnetisation switching for fi eld parallel to the wire axis is evident from the peculiar high fi eld M(T) curve en_US
dc.description.sponsorship Cochin University of Science & Technology en_US
dc.language.iso en en_US
dc.publisher Springer en_US
dc.subject Magnetic nanowires en_US
dc.subject mobility assisted growth en_US
dc.subject magnetostatic interaction en_US
dc.subject electrodeposition en_US
dc.subject magnetisation switching en_US
dc.title On the Growth Mechanism of Nickel and Cobalt Nanowires and Comparison of Their Magnetic Properties en_US
dc.type Article en_US


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