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Abstract:
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The radio frequency plasma generated during the sputtering of Indium Tin Oxide target using Argon
was analyzed by Langmuir probe and optical-emission spectroscopy. The basic plasma parameters
such as electron temperature and ion density were evaluated. These studies were carried out by
varying the RF power from 20 to 50 W. A linear increase in ion density and an exponential decrease
in electron temperature with rf power were observed. The measured plasma parameters were then
correlated with the properties of ITO thin films deposited under similar plasma conditions. |