Transparent p-AgCoO2/n-ZnO diode heterojunction fabricated by pulsed laser deposition

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Transparent p-AgCoO2/n-ZnO diode heterojunction fabricated by pulsed laser deposition

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dc.contributor.author Jayaraj, M K
dc.date.accessioned 2008-09-01T06:27:43Z
dc.date.available 2008-09-01T06:27:43Z
dc.date.issued 2007-03-01
dc.identifier.other www.elsevier.com/locate/tsf,Thin Solid Films 515 (2007) 7352–7356
dc.identifier.uri http://dyuthi.cusat.ac.in/purl/791
dc.description.abstract Transparent diode heterojunction on ITO coated glass substrates was fabricated using p-type AgCoO2 and n-type ZnO films by pulsed laser deposition (PLD). The PLD of AgCoO2 thin films was carried out using the pelletized sintered target of AgCoO2 powder, which was synthesized in-house by the hydrothermal process. The band gap of these thin films was found to be ~3.89 eV and they had transmission of~55% in the visible spectral region. Although Hall measurements could only indicate mixed carrier type conduction but thermoelectric power measurements of Seebeck coefficient confirmed the p-type conductivity of the grown AgCoO2 films. The PLD grown ZnO films showed a band gap of ~3.28 eV, an average optical transmission of ~85% and n-type carrier density of~4.6×1019 cm− 3. The junction between p-AgCoO2 and n-ZnO was found to be rectifying. The ratio of forward current to the reverse current was about 7 at 1.5 V. The diode ideality factor was much greater than 2. en_US
dc.language.iso en en_US
dc.publisher Elsevier en_US
dc.subject Pulsed laser deposition en_US
dc.subject p-type en_US
dc.subject p–n junction en_US
dc.title Transparent p-AgCoO2/n-ZnO diode heterojunction fabricated by pulsed laser deposition en_US
dc.type Working Paper en_US


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