| dc.contributor.author |
Joseph, Mathai C |
|
| dc.contributor.author |
Anantharaman, M R |
|
| dc.contributor.author |
Venkitachalam, S |
|
| dc.contributor.author |
Jayalekshmi,S |
|
| dc.date.accessioned |
2012-03-29T09:01:58Z |
|
| dc.date.available |
2012-03-29T09:01:58Z |
|
| dc.date.issued |
2002-09 |
|
| dc.identifier.issn |
0040-6090 |
|
| dc.identifier.other |
Thin Solid Films Volume 416, Issue 1-2, 2 September 2002, Pages 10-15 |
|
| dc.identifier.uri |
http://dyuthi.cusat.ac.in/purl/2832 |
|
| dc.description.abstract |
Polyfurfural thin films lying in the thickness range of 1300–2000 A˚ were prepared by ac plasma polymerization technique.
The current–voltage characteristics in symmetric and asymmetric electrode configuration were studied with a view to determining
the dominant conduction mechanism.It was found that the Schottky conduction mechanism is dominant in plasma polymerized
furfural thin films.The predominance of Schottky mechanism was further confirmed based on the thermally stimulated current
measurements. |
en_US |
| dc.language.iso |
en |
en_US |
| dc.publisher |
Elsevier |
en_US |
| dc.subject |
Plasma processing and deposition |
en_US |
| dc.subject |
Polymers |
en_US |
| dc.subject |
Conduction mechanism |
en_US |
| dc.subject |
TSC |
en_US |
| dc.title |
Mechanism of electrical conduction in plasma polymerized furfural thin films |
en_US |
| dc.type |
Working Paper |
en_US |